Effect of the Deposition Sequence of Ti and W on the Ni-Based Ohmic Contacts to N-Type 4h-SicNiannian Ge,Caiping Wan,Wenhao Lu,Zhi Jin,Hengyu Xucrossref(2024)引用 0|浏览0暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要