A Strategy to Enhance the B-Solubility and Mechanical Properties of Ti–B–N Thin Films

Acta Materialia(2024)

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摘要
The Ti–B–N system offers a wide range of possible meta(stable) phases, making it interesting for science and industry. However, the solubility for B within the face-centered cubic (fcc)-TiN lattice is rather limited and less studied, especially without forming B-rich phases. Therefore, we address how chemistries along the TiN–TiB2 or TiN–TiB tie-line influence this B-solubility. The variation between these two tie-lines is realized through non-reactive co-sputtering of a TiN, TiB2, and Ti target. We show that for variations along the TiN–TiB tie-line, even 8.9 at.% B (equivalent to 19.3 at.% non-metal fraction) can fully be incorporated into the fcc-TiNy lattice without forming other B-containing phases. The combination of detailed microstructural characterization through X-ray diffraction and transmission electron microscopy with ab initio calculations of fcc Ti1-xNBx, TiN1-xBx, and TiN1-2xBx solid solutions indicate that B essentially substitutes N.The single-phase fcc-TiB0.17N0.69 (the highest B-containing sample along the TiN–TiB tie-line studied) exhibits the highest hardness H of 37.1±1.9 GPa combined with the highest fracture toughness KIC of 3.0±0.2 MPa·m1/2 among the samples studied. These are markedly above those of B-free TiN0.87 having H = 29.2±2.1 GPa and KIC = 2.7±<0.1 MPa·m1/2.
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关键词
Physical vapor deposition (PVD),solubility,fracture toughness,mechanical properties,DFT
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