High-frequency characteristics of multilayer graphene nanoribbon interconnects: Exploring the implications OF SKIN effect

A study is undertaken to explore the frequency-dependent traits of crosstalk delay (X-D), crosstalk noise area (X-NA), and the mean time to failure induced by electromigration (EM-MTF) in interconnects constructed from lithium-doped multilayer graphene nanoribbon (Li-MLGNR) and their optimized counterparts, known as optimized Li-MLGNR (O-LiMLGNR) interconnects. The analysis is based on the skin depth and impedance model incorporating scatterers and the finite thickness of the interconnect. The obtained high-frequency impedance and performance characteristics reveals that O-LiMLGNR outperforms Li-MLGNR, rough copper, and mixed carbon nanotube bundle in terms of X-D, X-NA, and EM-MTF. Subsequently, the performance of O-LiMLGNR, limited by process and temperature variations, is analyzed at high frequencies under the influence of skin-effect. As a result of variations in process parameters and temperature, the O-LiMLGNR exhibits an increase in variations of X-D and X-NA, accompanied by a reduction in variation of EM-MTF as the frequency increases.