Coupled study on in-situ synchrotron high-energy X-ray diffraction and in-situ EBSD on the interfacial stress gradient in layered metals

As one of the heterostructures, the layered structure has attracted extensive research interest as it achieves superior properties to individual components. The layer interface is considered a critical factor in determining the mechanical properties of layered metals, where heterogeneity across the interface results in the strengthening of the soft layer and forming an interfacial stress gradient in the hard layer. However, there is still limited research associated with the formation of interfacial stress gradients in the hard layer, as stress measurement at high spatial resolution remains technically challenging. In the present study, we experimentally quantified the formation of interfacial stress gradients in the Ti layer of Ti/Al layered metal upon tension using in-situ high-energy X-ray diffraction (XRD). The analysis coupling in-situ high-energy XRD and in-situ electron back-scattered diffraction (EBSD) suggested that the interfacial stress gradient in the Ti layer rapidly rose as the Al layer was insufficient to accommodate the deformation of Ti. During the later deformation stage, collective effects of dislocation motion and geometrically necessary dislocation (GND) accumulation in the Al layer determined the evolution of interfacial stress gradients. The maximum interfacial stress gradient is below 0.4 MPa/μm in Ti layers, with a constant range width of 35 μm independent of the macroscopic strain. The present study therefore opens a new window to local stress modification using incompatible component deformation, which is instructive for the design and fabrication of high-performance layered metals.