Generation and high-resolution imaging of higher-order polarization via metasurface
arxiv(2024)
摘要
The generation and focusing properties of higher-order polarized beams have
attracted lots of interests due to its significant applications. In this
paper,we derived the formula of transforming linear polarization into
higher-order polarization, which is applicable to generating arbitrary order
polarization. Based on the derived formula, the focusing properties of
higher-order polarization by dielectric metasurface lens are studied , which
exhibit an Abbe-limit-breaking feature for small numerical aperture, i.e.,
NA<0.6. When a binary phase (0 π) is further imposed on the aperture of
metasurface lens, the focusing spot of fourth-order polarization breaks Abbe
limit even by 14.3
tolerance, say, substrate thickness and central deviation, on the focusing
feature of higher-order polarization is also investigated. Our study may find
significant applications in achieving higher-resolution lithography and
imaging, say, by just replacing conventional linear or circular polarization
with higher-order polarization.
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