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Optimization of the Process Parameters for the AlN Crystal Growth in the PVT Method Through an Improved Numerical Simulation Considering Partial Pressure of Gas Phases

C. J. Peng, X. G. Yao, X. Y. Miao, S. W. Chen, Q. F. Lu,X. J. Han, D. Shi,Y. L. Shao, Y. Z. Wu, X. P. Hao

CRYSTENGCOMM（2024）

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关键词
Thin Film Growth
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