A 185-GHz Low-Noise Amplifier Using a 35-nm InP HEMT Process

Jonathan Tao,Wonho Lee, Jeff Shih-Chieh Chien,James F. Buckwalter

IEEE MICROWAVE AND WIRELESS TECHNOLOGY LETTERS(2024)

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摘要
We present a four-stage, 185-GHz indium phosphide (InP) high electron mobility transistor (HEMT) low-noise amplifier (LNA) implemented with coplanar waveguide (CPW) inductive degeneration and designed with a procedure using noise measure. At 194 GHz, the LNA exhibits a peak 19.6 dB of gain with an input 1-dB compression point (P1dB) of -23.7 dBm at 190 GHz. To our knowledge, this is the first P1dB measurement over frequency for this technology. Over a frequency range covering 175 to 200 GHz, the LNA exhibits noise figure (NF) ranging from 9.8 to 11.4 dB. The amplifier consumes 22 of power and 0.77 m(2) of area. Additionally, a novel figure of merit (FoM) based on noise measure is proposed to evaluate designs across technologies independent of the number of stages.
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关键词
1-DB compression point (P1DB),figure of merit (FoM),G-band,high electron mobility transistor (HEMT),indium phosphide (InP),low-noise amplifier (LNA),millimeter wave
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