Self-Aligned WO x S/D Contacts to Gate Stacks with TiO x Nucleation Layer by Multiple-Deposition Method in WSe 2 pFETs

Extended Abstracts of the 2023 International Conference on Solid State Devices and Materials（2023）

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Self-Aligned WO &lt;sub&gt;x&lt;/sub&gt; S/D Contacts to Gate Stacks with TiO &lt;sub&gt;x&lt;/sub&gt; Nucleation Layer by Multiple-Deposition Method in WSe &lt;sub&gt;2&lt;/sub&gt; pFETs