Controlling photoluminescence of silicon quantum dots using pristine-nanostates formation

This study investigates the effective control of photoluminescence (PL) of silicon nanocrystals (Si-NCs) embedded in a SiO2 matrix, with a specific focus on tuning the luminescent wavelength profile and intensity for silicon-based optoelectronic applications. By manipulating the composition ratio (x) of SiOx, the well-known simultaneous changes in PL peak position and intensity were observed after annealing. To preserve the desired wavelength characteristics and enhance the luminesce intensity, we propose a novel approach to generate pristine nanostates (PNs) for Si-NC formation using proton irradiation (PI). The application of proton irradiation was found to be successful in significantly increasing PL intensity while strongly suppressing the peak position shifts. Through extensive spectroscopic analysis including PL, X-ray photoelectron spectroscopy, and absorption spectroscopy, we investigate specific defect states in the SiOx matrix, and identified as PNs. We interpret that these PNs consist of self-trapped exciton, E ' center, non-bridging oxygen hole center, and oxygendeficiency center states. In the as-grown sample, the PNs promote appropriate phase separation and play a significant role in stabilizing the structure during the subsequent annealing processes. This study elucidates the Si-NC formation mechanism by enhancing O-diffusion-induced phase separation, a process accelerated in SiOx with controlled PNs. The proposed PI-induced PNs offer a novel pathway for developing Si-based optoelectronic devices with desired characteristics in the operating wavelength range. These findings open up promising possibilities for advanced silicon-based optoelectronic applications.