Unmasking the Resolution–Throughput Tradespace of Focused‐Ion‐Beam Machining (Adv. Funct. Mater. 38/2022)

Focused-Ion-Beam Machining Sacrificial masking films enable focused-ion-beam machining of complex nanostructures beyond the resolution limit of the ion beam, but current understanding of this super-resolution effect is both empirical and spatial. In article number 2111840, Samuel M. Stavis and co-workers introduce chromia as a multifuntional masking material and develop new theory that elucidates the resolution–throughput tradespace, revealing that the dominant advantage of the super-resolution effect is temporal.