Ultra-high Tunneling Electroresistance Ratio (2 × 10 4 ) & Endurance (10 8 ) in Oxide Semiconductor-Hafnia Self-rectifying (1.5 × 10 3 ) Ferroelectric Tunnel Junction.

Junghyeon Hwang, Chaeheon Kim,Hunbeom Shin, Hwayoung Kim, Sang-Hee Ko Park,Sanghun Jeon

Symposium on VLSI Circuits(2023)

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