Surface characterization of ultra low-k SiCOH films in inductively coupled fluorocarbon plasmasHoonbae Kim, Hee-Jin Jang,Donggeun Jung,Heeyeop Chae한국표면공학회 학술발표회 초록집(2013)引用 0|浏览0暂无评分关键词fluorocarbon plasmasAI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要