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EUV Lithography Line-Space Pattern Rectification Using Block Copolymer Directed Self-Assembly: a Roughness and Defectivity Study

Julie Van Bel,Lander Verstraete,Hyo Seon Suh,Stefan De Gendt,Philippe Bezard,Jelle Vandereyken,Waikin Li,Matteo Beggiato,Amir-Hossein Tamaddon,Christophe Beral,Andreia Santos, Boaz Alperson,YoungJun Her

Novel Patterning Technologies 2023（2023）

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