Low-Loss Compact Lithium Niobate Photonic Integrated Circuits
2023 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)（2023）
关键词
argo plasma-assisted ion beam dry etching,e-beam exposure,fabrication flow optimization,fully etched LN waveguide platform,LiNbO3/int,low-loss compact lithium niobate photonic integrated circuits,smooth sidewall roughness,ultralow propagation losses,ultrasmall circuit size
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