Next generation 1200V, 3.5mΩ.cm2 SiC planar gate MOSFET with excellent HTRB reliability
2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD)(2018)
摘要
In this paper, we report on 1200V SiC planar gate MOSFETs with an improved tradeoff between on-resistance and reverse bias gate oxide electric field. The improved tradeoff was obtained by optimizing the JFET doping profile and unit cell design. These MOSFETs showed a specific on-resistance of 3.5mOhm.cm
2
at room temperature, increasing to 5.9mOhm.cm
2
at 175°C, along with excellent High Temperature Reverse Bias (HTRB) reliability as shown by no failures after stressing at 1440V, 175°C for 1000 hours.
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关键词
silicon carbide,reliability,power MOSFET,high voltage
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