Next generation 1200V, 3.5mΩ.cm2 SiC planar gate MOSFET with excellent HTRB reliability

2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD)(2018)

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摘要
In this paper, we report on 1200V SiC planar gate MOSFETs with an improved tradeoff between on-resistance and reverse bias gate oxide electric field. The improved tradeoff was obtained by optimizing the JFET doping profile and unit cell design. These MOSFETs showed a specific on-resistance of 3.5mOhm.cm 2 at room temperature, increasing to 5.9mOhm.cm 2 at 175°C, along with excellent High Temperature Reverse Bias (HTRB) reliability as shown by no failures after stressing at 1440V, 175°C for 1000 hours.
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关键词
silicon carbide,reliability,power MOSFET,high voltage
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