Triple-Etch Grating for Near Perfect Coupling at Normal Incidence

Carson G. Valdez,Sunil Pai,Payton Broaddus,Olav Solgaard

2023 Conference on Lasers and Electro-Optics (CLEO)（2023）

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摘要

We numerically demonstrate a grating coupler design with a peak efficiency of 96%(−0.18dB) at normal incidence on standard Silicon-On-Insulator. This design takes into account fabrication constraints suitable for E-beam lithography and can be realized through three consequtive etch steps.

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关键词

account fabrication constraints,consequtive etch steps,grating coupler design,near perfect coupling,noise figure -0.18 dB,normal incidence,peak efficiency,Silicon-On-Insulator,triple-etch grating

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