A Maskless Lithography System Based on Digital Micromirror Devices (DMD) and Metalens Arrays

Shiqi Luo, Kaitrin Weber,Haiyun Guo,Wenqi Zhu,Amit Agrawal,Imad Agha

2023 Conference on Lasers and Electro-Optics (CLEO)（2023）

引用 0|浏览2

暂无评分

摘要

In a novel maskless lithography system, a metalens array focuses the light from assigned micromirrors to expose the photoresist. Arbitrary high-resolution patterning on the photoresist can be achieved.

查看译文

AI 理解论文

溯源树

样例

生成溯源树，研究论文发展脉络

Chat Paper

正在生成论文摘要