Advances in Materials and Junction Engineering Enabled by Epi

Epitaxy is a powerful technique used in the construction of semiconductor devices, where a monocrystalline film is grown on a surface or structure to create a perfect foundation layer. This technique is used for several purposes, including the deposition of crystalline films with controlled electrical properties, modification of mechanical attributes, and formation of precise junctions with low defect levels. In this paper, we will explore how material and junction engineering can be achieved using epitaxy.