Improving FinFET Junctions and Contacts Via Laser Annealing
2023 21st International Workshop on Junction Technology (IWJT)（2023）
Key words
3D channel geometry,channel resistance,contact resistances,effective channel width,fin pitch,FinFET junctions,gate perimeter,gate width,laser annealing,metallic contact width,nanosecond laser,parasitic external resistance,performance limiting factor,planar FET,semiconductor industry transitions,three-dimensional transistors,transistor width,transistor-level specific contact resistivity
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