Sequential Design of PEALD In–Ga–Zn–O Active Layer for Enhancing TFT Stability

Hae Lin Yang,Yoon-Seo Kim, Taewon Hwang, Sunao Kamimura, Aya Eizawa,Takashi Teramoto,Christian Dussarrat, Takashi Ono,Jin-Seong Park

IEEE TRANSACTIONS ON ELECTRON DEVICES（2023）

引用 4|浏览10

关键词

Films,Zinc oxide,II-VI semiconductor materials,Thin film transistors,Stress,Metals,Semiconductor device measurement,Indium-gallium-zinc oxide (IGZO),oxide semiconductor,plasma-enhanced atomic layer deposition (PEALD),sequential design

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