Triethylamine borane thermal decomposition for BN low pressure chemical vapour deposition

Triethylamine borane (TEAB) complex was studied as a potential precursor for the thermal low pressure chemical vapour deposition (LPCVD) of pure crystalline sp2-hybridised BN. In particular, its thermal decomposition with or without ammonia was characterised from thermodynamic and experimental points of view in the temperature ranges 400-2000 degrees C and 300-1300 degrees C, respectively. NH3 plays a role in the gas phase equilibrium by providing a nitriding source that promotes HCN formation at high temperatures. NH3 is also a source of hydrogen for light hydrocarbons formation as it decomposes. It is thus possible to promote gaseous carbon species formation at high temperatures and limit carbon introduction into coatings by adding ammonia. A turbostratic BN coating could be obtained by CVD from a TEAB/NH3/N2 mixture and conditions chosen thanks to the gas phase decomposition study.