Low temperature electrical transport in thin carbon films deposited on SiO₂/Si substrates by pulsed laser deposition

In this paper electrical transport studies are performed on thin carbon films deposited on SiO2/Si substrates by pulsed laser deposition (PLD) applying laser ablation of micro-crystalline graphite target. Experiments were carried out on 320 - 420 nm thick SiO2 on Si substrates as well as on hydrogenated diamond-like carbon (DLC) films deposited on SiO2/Si. Structural studies by means of XPS, SEM and Raman spectroscopy revealed that the films can be characterized as nano-sized carbon phases possessing different phase composition (i.e. the ratio sp(3)/sp(2) hybridized carbon, etc.). The electrical conductivity/resistivity of the films was measured in the temperature range 10 K < T < 300 K. Four-contact Van der Pauw method as well as two contact schemes have been applied. Some films have low room temperature resistivity in the range rho = (0.1-1.5)x10(-3) Omega.center dot m and consist predominantly of sp(2) hybridized carbon with Raman spectra, which resemble that of nano-sized graphene depending on the deposition conditions and substrates used. The thinnest only 0.5 nm layer deposited directly on SiO2 exhibits relatively low specific resistance (similar to 10-3 Omega. m), which can be taken as an indication of good deposition conditions of graphene-like layers. The current flow mechanism was explored at temperatures from 300 K down to 10K. The temperature dependence reveals non-metallic behavior - the conductivity decreases at decreasing temperature as opposed to typical metal behaviour. A model of variable range hopping (VRH) mechanism is applied to explain the low temperature conductivity drawn from transport in nanocrystalline disordered systems.