Creating zinc-hyperdoped silicon with modulated conduction type by femtosecond laser irradiation

Silicon, as the earth-abundant semiconductor, has low cost and good compatibility with mature complementary metal-oxide-semiconductor technology. Therefore, instead of choosing the proper semiconductor with a specific bandgap energy, hyperdoping technique, which can introduce deep-level dopants and intermediate band into silicon, enable silicon to operate in infrared wavebands. Particularly, the hyperdoped silicon with transition metals, having low ionized impurity scatting, makes silicon a promising infrared detection material. In present work, zinc-hyperdoped silicon is fabricated by femtosecond pulsed laser irradiation. The doping concentration of zinc has exceeded 1019 cm−3, and even reached 1022 cm−3, which is about five orders of magnitude greater than the solid solubility of zinc in crystalline Si. The zinc-hyperdoped silicon shows sub-bandgap absorptance of 87.86 % at 1310 nm. Temperature-dependent Hall effect measurements prove that zinc doping results in acceptor energy level located at 0.520 eV above the valence band maximum. It is worth nothing that, zinc-oxygen related defect state results in donor energy level located at 0.252 eV below the conduction band minimum when lower laser fluence is used, which means the energy level of impurity is altered by the presence of undesignedly doped oxygen atoms, suggesting compound formation between the zinc atoms and oxygen atoms.