Frequency fluctuation in resonant circuit due to spatial movement of plasma

Kiyoyuki Yambe, Naomasa Ishizawa, Iwao Ohyama

AIP ADVANCES(2023)

引用 0|浏览0
暂无评分
摘要
In an electrical circuit with plasma generation, the resistance and reactance components on the circuit cause a phase difference between the applied voltage and the power supplied current. The resistance and reactance components are determined by the dielectric, working gas, and plasma that make up the circuit. While each component of the dielectric and working gas is constant, the plasma component varies depending on its properties. As a result, the resonant frequency in the circuit varies depending on the plasma properties. In a configuration where plasma is emitted from a quartz tube and irradiated onto a copper disk, the reactance component is inductive when the plasma is generated in a single shot. When the intensity of the dynamic electric field generated by the plasma charging on the copper disk exceeds the intensity of the dynamic electric field formed by the power supplied electrode, the reactance component is capacitive because the plasma reciprocates between the electrode and the copper disk.
更多
查看译文
关键词
frequency fluctuation,resonant circuit,plasma
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要