Ion- and temperature-induced 3-dimensional nanoscale patterning in Ti1-xAlxN deposited by High Power Impulse Magnetron Sputtering

Clementine Warres,J.C. Meyer, T. Lutz, P. Albrecht, B. Schröppel, W. Engelhart, J. Kümmel

Thin Solid Films（2023）

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摘要

•Ion induced patterning during High Power Impulse Magnetron Sputtering of Ti1-x AlxN.•Different patterns adjustable - single phase or two phase films.•Pattern formation similar to ion beam irradiation with co-deposition.•different sputter yields of constituents cause pattern formation.•composition-dependent wurtzite formation for given deposition parameters.

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关键词

Titanium aluminum nitride,High Power Impulse Magnetron Sputtering,Chemical,Patterning,Self-organization,Wurtzite phase,Rocksalt phase,V-Shaped structures,Edge effect

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