A low-cost fabrication method for high aspect ratio nano-channels by near-field UV exposure and thermal nanoimprinting

A low-cost fabrication method for high aspect ratio nano-channels is proposed in this paper. The near-field exposure principle based on Fresnel diffraction was analyzed and the silicon nano-mold with the height of 962 & PLUSMN; 9 nm and width of 332 & PLUSMN; 12 nm was produced. Furthermore, the applicable demolding conditions for high aspect ratio nanoimprinting were studied, and the SU-8 nano-channels with the height of 947 & PLUSMN; 17 nm and width of 336 & PLUSMN; 13 nm were fabricated.