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Optimization of Spin-on Metal Oxide Resist Performance Via New Development Techniques on Sub-30Nm Pitch Patterning

Lior Huli,Kanzo Kato,Steven Gueci,Nathan Antonovich,Steven Grzeskowiak,David Hetzer,Eric Liu,Alexandra Krawicz,Satoru Shimura,Shinichiro Kawakami,Soichiro Okada,Karen Petrillo,Luciana Meli, Nicholas Latham,Yasiel Cabrera, Belle Antonovich

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL（2023）

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Key words
Extreme Ultraviolet Lithography (EUVL),Metal Oxide Resist (MOR),ESPERT (TM) (Enhanced Sensitivity developer Technology (TM))
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