Novel Strategies for Highly Uniform and Reliable Cell Characteristics of 8th Generation 1Tb 3D-NAND Flash Memory.

Changhwan Lee, Min-Tai Yu,Sejun Park, Hoki Lee, Bio Kim,Suhwan Lim,Jaeduk Lee,Sung-Hun Lee, Mincheol Park,Sujin Ahn,Sunghoi Hur

VLSI Technology and Circuits(2023)

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摘要
The industry leading 8th generation 1Tb 3D-NAND flash memory (8th 3D-NAND) has been developed while possessing the smallest unit cell volume among all 3D-NAND products. Despite increasing stacking layers from 176 to 236, we improved the uniformity of channel hole size by utilizing the state of the art HARC (high-aspect ratio contact) etching technology. Degradation of interference and retention characteristics due to the cell scale-down is overcome by several ingenious technologies, leading to the development of highly reliable high performance device.
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