Towards low damage and fab-compatible top-contacts in MX2 transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach.S. Kundu, D. H. van Doip,Tom Schram,Quentin Smets, S. Banerjee,Benjamin Groven,Daire Cott, S. Decoster, P. Bezard, F. Lazzarino,K. Banerjee, S. Ghosh, J. F. de Mamelfe,Pierre Morin,Cesar J. Lockhart de la Rosa,Inge Asselberghs,Gouri Sankar KarVLSI Technology and Circuits（2023）引用 0|浏览6暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
