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Coater/developer-based Techniques to Achieve Tight Pitches Towards High-Na EUV

Kanzo Kato,Lior Huli,Nathan Antonovich,David Hetzer, Steven Grezeskowiak,Eric Liu,Akiteru Ko,Satoru Shimura,Shinichiro Kawakami,Takahiro Kitano,Seiji Nagahara,Luciana Meli,Indira Seshadri,Martin Burkhardt,Karen Petrillo

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL（2023）

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Extreme ultraviolet lithography (EUVL),metal oxide resist (MOR),defectivity improvement
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