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Defectivity Reduction in EUV Resists Through Novel High-Performance Point-Of-Use (POU) Filters

Yiren Zhang,Toru Umeda, Hirokazu Sakakibara, Sheik Ansar Usman Ibrahim, Atsushi Sakamoto,Amarnauth Singh,Robert Shick,Karl Skjonnemand,Philippe Foubert,Waut Drent

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL（2023）

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关键词
EUV Lithography,microbridges,bulk filtration,POU filtration
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