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Recent Advances in EUV Patterning in Preparation Towards High-Na EUV

Seiji Nagahara,Arnaud Dauendorffer,Arame Thiam, Xiang Liu,Yuhei Kuwahara,Cong Que Dinh,Soichiro Okada,Shinichiro Kawakami,Hisashi Genjima,Noriaki Nagamine,Makoto Muramatsu,Satoru Shimura, Atsushi Tsuboi,Kathleen Nafus,Yannick Feurprier,Marc Demand,Rajesh Ramaneti,Philippe Foubert,Danilo De Simone, Geert Vendenberghe

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL（2023）

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Key words
High NA EUV lithography,metal oxide resists (MOR),chemically amplified resists (CAR),ESPERT (TM)
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