Concurrent Steiner Tree Selection for Global routing with EUVL Flare Reduction

The aggressive scaling down of the feature size in modern ICs has introduced major bottlenecks in printing layouts using a conventional 193nm immersion lithography system. As different mitigation techniques have reached their limitations, Next Generation Lithography (NGL) techniques have been gaining popularity. Extreme Ultra-violet Lithography (EUVL) system which uses light having 13.5nm wavelength is one of the popular NGL for printing features below 20nm. However, EUVL faces the problem of flare caused by irregular reflection from clear-field mask surfaces used. It leads to distortion of critical dimension (CD) during layout printing which in turn degrades the performance of the circuit. In this paper, we have formulated a delay-aware global routing problem in order to minimize flare without sacrificing the delay. Two different solvers, namely ILP and SAT-SMT, are employed and the results are compared. Experimental results show a significant reduction in flare without much compromise on delay.