Memory properties and short-range order in silicon oxynitride-based memristors

Silicon oxynitride films of various compositions were grown by the plasma-enhanced chemical deposition method using a setup with remote plasma and an inductive excitation from a gas mixture of 10% monosilane (diluted with argon) and nitrogen in the presence of residual oxygen in working gas mixtures. The high-frequency generator power (13.56 MHz) was varied in the range of 50-150 W. The samples composition was studied using x-ray photoelectron spectroscopy. A comparison of the experimental Si 2p photoelectron spectrum with the calculation showed that, at a low generator power (50 W), the short-range order in silicon oxynitride films is better described by the "random mixture" model. As the generator power is increased (100 W and higher), the excess silicon content in a silicon oxynitride film is decreased, and the short-range order is better described by the "random bonding" model. On metal-insulator-semiconductor-structures based on the silicon oxynitride films obtained, measurements of current-voltage characteristics were carried out, and the resistive switching of the obtained structures is studied in the present contribution. It is found that, in films in which the short-range order is described by the random bonding model, a stable switching in the bipolar regime is observed.