Influence of Si-Doping on 45 nm Thick Ferroelectric ZrO2 Films Bohan Xu, Patrick D. Lomenzo,Alfred Kersch,Thomas Mikolajick, Uwe SchroederACS Applied Electronic Materials(2022)引用 0|浏览0暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要