Damage-free pinpoint particle removal for EUV pellicle cleaning

Hyun-Gyu Kang, Dong Hyeon Kwon,Tae-Gon Kim,Jin-Ho Ahn, Byung-Hoon Lee,Jin-Goo Park, Hwan Seok Seo, Hee Bom Kim

Photomask Technology 2022(2022)

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