Total Ionizing Dose Response of a 22-nm Compiled Fully Depleted Silicon-on-Insulator Static Random Access Memory

IEEE TRANSACTIONS ON NUCLEAR SCIENCE(2023)

引用 1|浏览7
暂无评分
摘要
The results of total ionizing dose (TID) experiments on fully depleted silicon-on-insulator (FDSOI) static random access memory (SRAM) are presented. Using Co-60 gamma irradiation, tests were conducted at multiple voltages and with and without read and write assists. The results demonstrate cell stability past 200 krad(Si) TID in standard operational modes. The impact of read and write assists and read timing via margin mode tests are examined. We also report input-output (IO)-level translation circuit failures, as well as anomalous circuit failures attributable to IO at relatively low TID dose. Finally, we show post-TID anneal and low-voltage SRAM results.
更多
查看译文
关键词
Transistors,Silicon-on-insulator,Integrated circuits,SRAM cells,Radiation effects,MOS devices,Circuit stability,Fully depleted silicon-on-insulator (FDSOI),static random access memory (SRAM),total ionizing dose (TID)
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要