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High-power EUV Free-Electron Laser for Future Lithography

Norio Nakamura,Ryukou Kato,Hiroshi Sakai,Kimichika Tsuchiya,Yasunori Tanimoto,Yosuke Honda,Tsukasa Miyajima,Miho Shimada,Takanori Tanikawa,Olga A. Tanaka,Takashi Obina,Hiroshi Kawata

JAPANESE JOURNAL OF APPLIED PHYSICS（2023）

引用 5|浏览21
关键词
EUV lithography,free-electron laser,energy-recovery linac,high-power light source,accelerator,future lithography,polarization control
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