Application of InP Quantum Dot film by Photolithography Technology on a Micro-LED Display

The technical of realizing full-color display by monochromatic integrated 100 x 100 blue Micro-LED array exciting InP quantum dot color conversion layer is researched in this study. Using photolithography technology to prepare color film on a separate glass cover glass has the advantages of better accuracy and display resolution. The optimum thickness 12 mu m of the quantum dot photoresist (QDPR) was verified and 10 mu m black matrix (BM) was proposed to reduce the light crosstalk between different sub-pixels. The thickness of color filter 1 +/- 0.4 mu m was made successfully between the QDPR and the cover glass, which can greatly can significantly increase the display color gamut from 78.7% to 100.8% NTSC. The red and green brightness conversion efficiency reach up to 78.1% and 296.5% respectively. Representative RGB monochromatic pictures with 100% high yield were displayed successfully.