Graphene Capping of Cu Back-End-of-Line Interconnects Reduces Resistance and Improves Electromigration Lifetime
ACS APPLIED NANO MATERIALS（2023）
关键词
graphene capping,back-end-of-line,Cu interconnects,electron scattering,electromigration
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要