The incorporation of AlScN ferroelectric gate dielectric in AlGaN/GaN-HEMT with polarization-modulated threshold voltage

APPLIED PHYSICS EXPRESS(2023)

引用 3|浏览10
暂无评分
摘要
In this work, the insertion of AlScN ferroelectric gate dielectric on the performance of the AlGaN/GaN HEMT device is investigated. With negative pre-poling on AlScN, the threshold voltage (V (th)) of the device shifts positively with a swing range of 3.26 V. The influence of polarization modulation is also reflected by the suppression of gate leakage and the reduction of the subthreshold swing of the device. The AlScN-integrated GaN HEMT exhibits an on/off ratio of 10(6) and a subthreshold swing of 80 mV dec(-1). The depletion mechanism of 2DEG at the AlGaN/GaN interface was well described by a TCAD model.
更多
查看译文
关键词
GaN,HEMT,ferroelectric material,polarization modulation,threshold voltage
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要