Peak-fitting of Cu 2p photoemission spectra in Cu0, Cu1+, and Cu2+oxides: A method for discriminating Cu0 from Cu1+

APPLIED SURFACE SCIENCE(2023)

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摘要
The photoemission spectra of Cu 2p are one of the most studied. Its analysis is especially challenging because, among others, the peaks for Cu0 and Cu1+ overlap, and Cu1+ and Cu2+ coexist under many conditions. The chemical state determination of metallic copper and the initial oxidation mechanism of copper require state-of-the-art peak fitting analysis and background modeling. This work presents a detailed and quantitative analysis of the Cu 2p photoemission spectra for a metallic ultra-thin film and the initial oxidation stages. Additionally, annealed films at 200 degrees C for up to 5 min were analyzed to assess the full oxidation of the copper oxides and assert the validity of the proposed peak-fitting procedures. For the initial oxidation, it was possible to accurately identify Cu1+ and Cu2+ states and, alongside, quantify the corresponding O 1s species, resulting in compositions close to stoichiometric values. Using the active background, it was possible to achieve close reproduction of all the photoemission spectra; three coexisting copper species were resolved during the fitting procedure. An ac-curate peak-fitting analysis allowed for quantifying the relative proportion of Cu1+ to Cu0 states despite their strong overlap.
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关键词
XPS,Shirley Background,Active background approach,Peak-fitting,Copper,Oxides,Block Approach,X-ray photoelectron spectroscopy
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