Performance Trade-Off of RFSOI Switches Under Scaled Bias Conditions

Siddhartha Dhar,Stephane Monfray,Frederic Gianesello,Franck Julien, Julien Dura, Charles-Alex Legrand, Julien Amouroux, Bernadette Gros,Loic Welter,Clement Charbuillet,Philippe Cathelin, Elodie Canderle,Nathalie Vulliet, Emmanuel Escolier, Lucas Antunes, Eric Rouchouze,Pascal Fornara,Christian Rivero,Guillaume Bertrand,Pascal Chevalier,Arnaud Regnier,Daniel Gloria, Alain Fleury

2023 IEEE 23rd Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems(2023)

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摘要
Over the years, RFSOI has emerged as dominant technology for building RF FEM modules with optimum cost and performance. RFSOI switches are typically designed using thick gate oxides with biasing up to 3. 3V to deliver minimum RON x COFF. With the strong push of operating digital devices at lower voltages, it would become necessary to evaluate the performance of the switch under such operating conditions. In this paper, we analyze the impact of RON x COFF of the switch in 200mm RFSOI technology, under scaled bias conditions and propose path for device optimization.
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关键词
RF switches,SOI,Low voltage operation
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