Advanced BEOL Materials, Processes, and Integration to Reduce Line Resistance of Damascene Cu, Co, and Subtractive Ru Interconnects
2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)（2022）
关键词
line-R reduction nanosecond laser anneal,reduce line resistance,line-R crossover,power rails,subtractive-etched interconnects,integration schemes,advanced BEOL materials,Cu,Co,Ru
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