BS-Patch: Constrained Bezier Parametric Patch

Vaclav Skala, Vit Ondracka

arxiv(2022)

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摘要
Bezier parametric patches are used in engineering practice quite often, especially in CAD/CAM systems oriented to mechanical design. In many cases quadrilateral meshes are used for tessellation of parameters domain. We propose a new modification of the Bezier cubic rectangular patch, the BS-patch, which is based on the requirement that diagonal curves must be of degree 3 instead of degree 6 as it is in the case of the Bezier patch. Theoretical derivation of conditions is presented and some experimental results as well. The BS-Patch is convenient for applications where for different tessellation of the u-v domain different degrees of diagonal curves are not acceptable.
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bs-patch
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