Hard X-ray Wavefront Engineering for Aberration Correction and Beam Shaping

ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS XVII(2022)

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摘要
While modern X-ray microscopes at synchrotron radiation sources and free-electron lasers require X-ray optics of highest quality, these optics often show aberrations due to limitations in fabrication technology. Based on ptychography, we determine these aberrations and fabricate tailor made refractive phase plates to compensate for them. Starting from the aberrated optics, diffraction-limited beams can be generated by introducing the phase plate behind these optics. In addition, the wavefront can be modified to generate custom beams for special needs, such as donut-shaped beams with orbital angular momentum or for structured-illumination microscopy. The nanofocused beam can be engineered in shape and phase by introducing specially designed phase plates. We introduce a general scheme for wavefront engineering and illustrate it with a numerical example.
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关键词
X-ray optics, ptychography, aberration correction, diffraction-limited focusing, beam shaping, wavefront engineering
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