Study on defocus image-based template matching algorithm for extreme ultraviolet mask phase defect detection
2022 International Workshop on Advanced Patterning Solutions (IWAPS)(2022)
摘要
In this paper, rigorous simulation and aerial imaging simulation were carried out for phase defects of EUV mask to obtain typical images of different types of phase defects. On this basis, a template matching algorithm based on defocus imaging was proposed to detect EUV mask phase defect and achieve a high detection rate of defects. It has good guidance and application value for the defect detection of extreme ultraviolet mask blank.
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关键词
EUV,Phase Defect,Image Processing,Template matching Algorithm
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