Study on defocus image-based template matching algorithm for extreme ultraviolet mask phase defect detection

2022 International Workshop on Advanced Patterning Solutions (IWAPS)(2022)

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摘要
In this paper, rigorous simulation and aerial imaging simulation were carried out for phase defects of EUV mask to obtain typical images of different types of phase defects. On this basis, a template matching algorithm based on defocus imaging was proposed to detect EUV mask phase defect and achieve a high detection rate of defects. It has good guidance and application value for the defect detection of extreme ultraviolet mask blank.
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关键词
EUV,Phase Defect,Image Processing,Template matching Algorithm
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