Corrigendum to “Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)” [J. Alloy. Compd. 857 (2021) 157931]
Journal of Alloys and Compounds（2023）
关键词
titanium dioxide films,titanium dioxide,atomic layer deposition,h2o
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