Effect of Gate Dielectric Material on the Electrical Properties of MoSe2-Based Metal-Insulator-Semiconductor Field-Effect Transistor

In this study, we fabricated metal-insulator-semiconductor field-effect transistors (MISFETs) based on nanolayered molybdenum diselenide (MoSe2) using two insulator materials, silicon dioxide (SiO2) and silicon nitride (SiN). We performed morphological and electrical characterizations in which the devices showed good electronic performance, such as high mobility and high I-on/I-off ratios exceeding 10(4). The subthreshold swing (ss) was somewhat high in all devices owing to the dimensions of our devices. In addition, the transfer curves showed good controllability as a function of gate voltage. The photogating effect was weakened in MoSe2/SiN/Si, indicating that SiN is a good alternative to silicon oxide as a gate dielectric material.