Optimization of Fluorine-based Plasma Etching Processes to Etch Silicon Nitride Nanostructures

Abubaker Mustafa Tareki,Boris Le Drogoff,Mohamed Chaker

OSA Advanced Photonics Congress 2021（2021）

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摘要

Controlled plasma etching processes based on fluorine-based plasmas to fabricate nanostructure in silicon nitride material are reported. These processes were optimized in terms of etch rate, sidewall profile and selectivity over resist mask material.

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关键词

plasma etching processes,silicon nitride nanostructures,fluorine-based

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